Joint Symposium with    

Symposium 20: Ion Beam and Nanomaterials

Nanoscience and nanotechnology has traversed a long path contributing its fruits to the human civilization. Its potential in revolutionizing materials science is noteworthy. Ion matter interaction is the first artificial technique for realizing self organization, which is one of the most fundamental concepts of nanoscience. Thus, ion beam irradiation is a potential tool for phase formation and material modification as a non-equilibrium technique. This is the first exclusive symposium on ion beam and nanomaterials, registering the vast progress in this field. The symposium will bring together budding researchers from various cross-disciplinary fields to discuss their achievements and project future directions.

This symposium is focused on the ion-beam processing and characterization of nanomaterials covering fields from experiment and theory.
Oral and poster sessions will include discussions on the frontier areas of nanoscience and nanotechnology relating to ion beam techniques.

Topics of interest include (but are not limited to):

Invited speakers (tentative) include:

R. S. Averback (Univ. of Illinios, Urbana-Champaign, USA), J. Fassbender (FZ Dresden, Germany), H. Hofsäss (Univ. Gottingen, Germany), H. Huang (Rensselaer Polytechnic Inst., USA), D. Ila (Alabama A&M Univ., USA),N. Kishimoto (National Inst. for Materials Science, Japan), P. Mazzoldi (Univ. di Padova, Italy), J. Melngailis (Univ. of Maryland, USA), S. Muto (Nagoya Univ., Japan), K. G. M. Nair (Indira Gandhi Ctr. for Atomic Research, India), J. C. Pivin (CSNSM, France), B. Rauschenbach (IOM Leipzig, Germany), M. Ridgeway (Australia National Univ., Australia), F. Schrempel (Univ. Jena, Germany), and M. Terrones (IPICyT, Mexico).

Symposium Organizers